HARMST 2011 (http://www.harmst2011.tw/) will be held in Hsinchu, Taiwan on June 12-18, 2011. This international workshop is the premier international event and devoted to the advancement of high aspect ratio manufacturing technologies and their applications. 1 abstracts from Tabata lab. was accepted by the technical program committee for the presentation. Authors and title of the papers is:
Y. Hirai, A. Uesugi, Y. Makino, H. Yagyu, K. Sugano, T. Tsuchiya, and O. Tabata Mechanical Characterization of Negative Photoresist by Nano-Indentation for Nano-Filtration Membrane
