SPIE Advanced Lithography 2015 will be held in San Jose, CA, USA, from 22 to 26 February 2015. This conference is the premier conference for the lithography community. From Tabata Lab., 1 abstract was accepted by the technical program committee as Oral presentation;
Conference 9426: Optical Microlithography XXVIII
[9426-14]
Optimization method for 3D lithography process utilizing DMD-based maskless grayscale photolithography system
Optimization method for 3D lithography process utilizing DMD-based maskless grayscale photolithography system
Xiaoxu Ma, Yoshiki Kato, Yoshikazu Hirai, Floris van Kempen, Fred van Keulen, Toshiyuki Tsuchiya, Osamu Tabata