ICP-RIE

mechCRwiki

[B52] ICP-RIE†

ULVAC NE-730
Nano-Platform Machine

Specification 仕様†

試料サイズ		4インチ
対応基板		Si, ガラス 等
エッチング可能材料	Si, SiO2，SiN, 強誘電材料
（実績のあるもの）
エッチングガス		SF6, CF4, CHF3, C4F8, Ar, O2
プラズマソース		誘導結合プラズマ

Procedure 利用方法†

Operation Training†

1. Contact Prof. Tsuchiya (tutti@me.kyoto-u.ac.jp) to get a permission of usage.
2. Get operation training.
3. After operation training, e-mail to Prof. Tsuchiya and Ms. K. Kawano.

On Use†

1. Book the machine through Website.
2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
3. Use it!
4. After usage, sign to the confirmation form.

Approved Users†

Toshiyuki Tsuchiya
Yoshikazu Hirai
Keiko Kawano
Kazuya Tatsumi

Tsuchiya LAB

Akane Nishimura(M2)

Eriguchi LAB

Takahiro Goya(D2)

Manual†

ICP-RIE_Manual(V5.1).pdf

Machine Administrator†

Toshiyuki Tsuchiya

Photo†