mechCRwiki
両面露光装置†
Nano-Platform Machine
Specification 仕様†
- Upto 4inch Wafer 4インチウエハまで可能
- Mask Holder 2.5 and 5 inch マスクホルダ:2.5インチ及び5インチ
- Backside Mark Alignment 裏面アライメントマークによるアライメント可能
- Resolution 解像度:~2μm
- Compatible for alignment with Vacuum Anodic Bonder 真空陽極接合装置のアライメントに利用可能
Procedure 利用方法†
Operation Training†
- Contact Prof. R. Yokokawa to get a permission of usage.
- After approval from Prof. Yokokawa, get operation training from a super user.
- After operation training, e-mail to Prof. R. Yokokawa and Ms. K. Kawano.
Reservation†
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use the machine.
- After usage, sign to the confirmation form.
Super Users†
Kazuya Fujimoto (Ext. 3687)
Takao Kajimoto (Ext. 3687)
Junya Suzuki (Ext. 3693)
Approved Users†
Toshiyuki Tsuchiya
Ryuji Yokokawa
Tasuku Nakahara
Junya Ikuta
Hirofumi Shintaku
Nagendra Kumar Kamisetty
Kazuya Fujimoto
Takao Kajimoto
Subramaniyan Parimalam Subhathirai
Kazuya Tsujimoto
KAWANO Keiko
大岡 正孝
鈴木 淳也
小北 雄亮
林 智也
Mohammed Gamil Mohammmed Abdelghany
寺島 健太
藁谷 卓哉
安富 貴浩~
邊見 哲也
四方 惟武希
Machine Administrator†
Ryuji Yokokawa
Photo†