Stepper の履歴(No.4)
mechCRwiki
[A52]ステッパ†
Nano-Platform Machine
Specification 仕様†
| 解像度 | 1.-2.5μm |
| N.A | 0.2-0.09 |
| 露光光源 | 超高圧水銀灯 |
| 主波長 | 365nm/365nm+436nm |
| (フィルタにより選択可能) |
| 縮小倍率 | 1/2 |
| 露光範囲 | Φ20-φ50mm |
| 総合アライメント精度 | <0.5um |
| アライメントシステム | GA |
| 対応基板サイズ | Max.□300mm |
| その他特長 | NA可変機構 |
Procedure 利用方法†
Operation Training†
- Contact Dr. Hirai (hirai@nms.me.kyoto-u.ac.jp) to get a permission of usage.
- Get operation training.
- After operation training, e-mail to Dr. Hirai and Ms. K. Kawano.
On Use†
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use it!
- After usage, sign to the confirmation form.
Approved Users†
None
Machine Administrator†
Yoshikazu Hirai
Photo†