mechCRwiki

汎用RIE

Samco 10NR

Specification 仕様

Gas: O2, Ar, CF4

Technical Infomation

SiO2 Etching

SiN Etching using CHF3 (CHF3 is not available now).

Procedure 利用方法

Manual (To be updated)

Operation Training

  1. Contact Prof. Tsuchiya (tutti@me.kyoto-u.ac.jp) to get a permission of usage.
  2. Get operation training.
  3. After operation training,e-mail to Prof. Tsuchiya and Ms. K. Kawano.

Reservation

  1. Book the machine through Website.
  2. Use the machine.

Super Users

Approved Users

★土屋研究室
Meffan Robert Claude(PD)
井嶋 泰貴(B4)

★平井研究室
清瀬 俊(D3)
浅越 雄介(M1)
村上 諒(M1)

Machine Administrator

Toshiyuki Tscuhiya

Photo

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