mechCRwiki

ステッパ

Nano-Platform Machine

Specification 仕様

解像度1.-2.5μm
N.A0.2-0.09
露光光源超高圧水銀灯
主波長365nm/365nm+436nm
(フィルタにより選択可能)
縮小倍率1/2
露光範囲Φ20-φ50mm
総合アライメント精度<0.5um
アライメントシステムGA
対応基板サイズMax.□300mm
その他特長NA可変機構

Procedure 利用方法

Operation Training

  1. Contact Dr. Hirai (hirai@nms.me.kyoto-u.ac.jp) to get a permission of usage.
  2. Get operation training.
  3. After operation training, e-mail to Dr. Hirai and Ms. K. Kawano.

On Use

  1. Book the machine through Website.
  2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
  3. Use it!
  4. After usage, sign to the confirmation form.

Approved Users

None

Machine Administrator

Yoshikazu Hirai

Photo