mechCRwiki
移動マスク露光装置†
Nano-Platform Machine
Specification 仕様†
| 露光光源 | 超高圧水銀灯 |
| 主波長 | 365nm, 405nm, 436nm |
| (フィルタにより選択可能) |
| 露光パワー | 39mW/cm2(UV-SN35) |
| 露光均一性 | ±5% |
| マスクサイズ | □5インチ |
| 試料サイズ | Φ4インチ |
| 試料厚 | 0.5mm |
| 位置決め | 手動 |
| 三次元加工 | 移動マスク露光 |
Procedure 利用方法†
Operation Training†
- Contact Dr. Hirai (hirai@nms.me.kyoto-u.ac.jp) to get a permission of usage.
- Get operation training.
- After operation training, e-mail to Dr. Hirai and Ms. K. Kawano.
On Use†
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use it!
- After usage, sign to the confirmation form.
Approved Users†
Yoshikazu Hirai
Hirofumi Shintaku
Daisuke Takagi
Keiko KAWANO
巽 和也
加藤 義基
邊見 哲也
Machine Administrator†
Yoshikazu Hirai
Photo†