mechCRwiki

移動マスク露光装置

Nano-Platform Machine

Specification 仕様

露光光源超高圧水銀灯
主波長365nm, 405nm, 436nm
(フィルタにより選択可能)
露光パワー39mW/cm2(UV-SN35)
露光均一性±5%
マスクサイズ□5インチ
試料サイズΦ4インチ
試料厚0.5mm
位置決め手動
三次元加工移動マスク露光

Procedure 利用方法

Operation Training

  1. Contact Dr. Hirai (hirai@nms.me.kyoto-u.ac.jp) to get a permission of usage.
  2. Get operation training.
  3. After operation training, e-mail to Dr. Hirai and Ms. K. Kawano.

On Use

  1. Book the machine through Website.
  2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
  3. Use it!
  4. After usage, sign to the confirmation form.

Approved Users

Yoshikazu Hirai
Hirofumi Shintaku
Daisuke Takagi
Keiko KAWANO
巽 和也
加藤 義基
邊見 哲也

Machine Administrator

Yoshikazu Hirai

Photo