mechCRwiki
両面露光装置†
Nano-Platform Machine
Specification 仕様†
- Upto 4inch Wafer 4インチウエハまで可能
- Mask Holder 2.5 and 5 inch マスクホルダ:2.5インチ及び5インチ
- Backside Mark Alignment 裏面アライメントマークによるアライメント可能
- Resolution 解像度:~2μm
- Compatible for alignment with Vacuum Anodic Bonder 真空陽極接合装置のアライメントに利用可能
Procedure 利用方法†
First time†
- Contact Prof. R. Yokokawa.
- After approval from Prof. Yokokawa, ask a super user for operation training.
- After operation training, the super user email to Prof. R. Yokokawa and Ms. Y. Nishimura to register.
Reservation†
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use it!
- After usage, sign to the confirmation form.
Yuriko Nishimura (Ext. 3687)
Kazuya Fujimoto (Ext. 3687)
Takao Kajimoto (Ext. 3687)
Junya Suzuki (Ext. 3693)
Machine Administrator†
Ryuji Yokokawa
Photo†