mechCRwiki

両面露光装置

Nano-Platform Machine

Specification 仕様

  • Upto 4inch Wafer 4インチウエハまで可能
  • Mask Holder 2.5 and 5 inch マスクホルダ:2.5インチ及び5インチ
  • Backside Mark Alignment 裏面アライメントマークによるアライメント可能
  • Resolution 解像度:~2μm
  • Compatible for alignment with Vacuum Anodic Bonder 真空陽極接合装置のアライメントに利用可能

Procedure 利用方法

First time

  1. Contact Prof. R. Yokokawa.
  2. After approval from Prof. Yokokawa, ask a super user for operation training.
  3. After operation training, the super user email to Prof. R. Yokokawa and Ms. Y. Nishimura to register.

Reservation

  1. Book the machine through Website.
  2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
  3. Use it!
  4. After usage, sign to the confirmation form.

SuperUsers

Yuriko Nishimura (Ext. 3687)
Kazuya Fujimoto (Ext. 3687)
Takao Kajimoto (Ext. 3687)
Junya Suzuki (Ext. 3693)

ApprovedUsers

Machine Administrator

Ryuji Yokokawa

Photo

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