mechCRwiki

[A54]両面露光装置

ユニオン光学 PEM-800
Nano-Platform Machine

Specification 仕様

  • Upto 4inch Wafer 4インチウエハまで可能
  • Mask Holder 2.5 and 5 inch マスクホルダ:2.5インチ及び5インチ
  • Backside Mark Alignment 裏面アライメントマークによるアライメント可能
  • Resolution 解像度:~2μm
  • Compatible for alignment with Vacuum Anodic Bonder 真空陽極接合装置のアライメントに利用可能

Procedure 利用方法

Operation Training

  1. Contact Prof. R. Yokokawa to get a permission of usage.
  2. After approval from Prof. Yokokawa, get operation training from a super user.
  3. After operation training, e-mail to Prof. R. Yokokawa and Ms. K. Kawano.

Reservation

  1. Book the machine through Website.
  2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
  3. Use the machine.
  4. After usage, sign to the confirmation form.

Super Users

See SuperUsers Page!

Approved Users

Ryuji Yokokawa
Toshiyuki Tsuchiya
Hirofumi Shintaku
Subhathirai Subramaniyan
Kazuya Fujimoto
Yusuke Kogita
Tomoya Hayashi
Tasuku Nakahara
Kenta Terashima
Abdelghany Mohammed Gamil Mohammed
Keiko Kawano
Tetsuya Henmi
Ibuki Shikata
Takuya Waratani
Singh Vijay Kumar(田畑研)
Kosuke Hokazono(田畑研)
Fumie Oda(小寺研)

Machine Administrator

Ryuji Yokokawa

Photo

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