mechCRwiki
ステッパ†
Nano-Platform Machine
Specification 仕様†
| 解像度 | 1.-2.5μm |
| N.A | 0.2-0.09 |
| 露光光源 | 超高圧水銀灯 |
| 主波長 | 365nm/365nm+436nm |
| フィルタにより選択可能) |
| 縮小倍率 | 1/2 |
| 露光範囲 | Φ20-φ50mm |
| 総合アライメント精度 | <0.5um |
| アライメントシステム | GA |
| 対応基板サイズ | Max.□300mm |
| その他特長 | NA可変機構 |
Procedure 利用方法†
First time†
- Contact Prof. R. Yokokawa.
- After approval from Prof. Yokokawa, ask a super user for operation training.
- After operation training, the super user email to Prof. R. Yokokawa and Ms. Y. Nishimura to register.
Reservation†
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use it!
- After usage, sign to the confirmation form.
Yuriko Nishimura (Ext. 3687)
Kazuya Fujimoto (Ext. 3687)
Takao Kajimoto (Ext. 3687)
Junya Suzuki (Ext. 3693)
Machine Administrator†
Ryuji Yokokawa
Photo†