mechCRwiki

ICP-RIE

DISCO DAD322
Nano-Platform Machine

Specification 仕様

  • 4inch Wafer 4インチウエハ専用
  • Etching GAS: SF6 CF4 CHF3 C4F8 Ar O2

Procedure 利用方法

Operation Training

  1. Contact Prof. Tsuchiya (tutti@me.kyoto-u.ac.jp) to get a permission of usage.
  2. Get operation training.
  3. After operation training, e-mail to Prof. Tsuchiya and Ms. K. Kawano.

On Use

  1. Book the machine through Website.
  2. Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
  3. Use it!
  4. After usage, sign to the confirmation form.

Approved Users

Toshiyuki Tsuchiya
Yoshikazu Hirai
Hirofumi Shintaku
巽 和也
Kazuya Tsujimoto
Daisuke Takagi
鈴木 淳也
小北 雄亮
西田 将志
松井 大門
寺島 健太
邊見 哲也

Machine Administrator

Toshiyuki Tsuchiya

Photo

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