mechCRwiki
ICP-RIE
DISCO DAD322
Nano-Platform Machine
Specification 仕様
- 4inch Wafer 4インチウエハ専用
- Etching GAS: SF6 CF4 CHF3 C4F8 Ar O2
Procedure 利用方法
Operation Training
- Contact Prof. Tsuchiya (tutti@me.kyoto-u.ac.jp) to get a permission of usage.
- Get operation training.
- After operation training, e-mail to Prof. Tsuchiya and Ms. K. Kawano.
On Use
- Book the machine through Website.
- Prepare nanohub reservation form and send it to nanohub office through your supervisor (or contacting person).
- Use it!
- After usage, sign to the confirmation form.
Approved Users
Toshiyuki Tsuchiya
Yoshikazu Hirai
Hirofumi Shintaku
巽 和也
Kazuya Tsujimoto
Daisuke Takagi
鈴木 淳也
小北 雄亮
西田 将志
松井 大門
寺島 健太
邊見 哲也
Machine Administrator
Toshiyuki Tsuchiya
Photo