[[mechCRwiki]
両面露光装置†
NanoplatHomeMachine
Specification 仕様†
- Upto 4inch Wafer 4インチウエハまで可能
- Mask Holder 2.5 and 5 inch マスクホルダ:2.5インチ及び5インチ
- Backside Mark Alignment 裏面アライメントマークによるアライメント可能
- Resolution 解像度:~2μm
- Compatible for alignment with Vacuum Anodic Bonder 真空陽極接合装置のアライメントに利用可能
Procedure 利用方法†
- First time user should contact Prof. R. Yokokawa (ryuji@me.kyoto-u.ac.jp) before user training.
- Ask a super user for training session.
- Upon approval of your usage, the super user email to Prof. R. Yokokawa and Ms. Y. Nishimura (nishimura.yuriko.7c@kyoto-u.ac.jp).
- Once authorized, your can book and use the equipment.
Yuriko Nishimura (Ext. 3687)
Kazuya Fujimoto (Ext. 3687)
Takao Kajimoto (Ext. 3687)
Junya Suzuki (Ext. 3693)
Machine Administrator†
Ryuji Yokokawa
Photo†